低維度硫族合金之電遷移與擴散行為研究
| dc.contributor.author | 謝宗雍 | zh_TW |
| dc.contributor.author | HSIEH TSUNG-EONG | en_US |
| dc.contributor.department | 國立交通大學材料科學與工程學系（所） | zh_TW |
| dc.date.accessioned | 2016-03-28T08:17:51Z | |
| dc.date.available | 2016-03-28T08:17:51Z | |
| dc.date.issued | 2015 | en_US |
| dc.description.sponsorship | 科技部 | zh_TW |
| dc.identifier.govdoc | MOST103-2221-E009-057-MY2 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=11269234&docId=454691 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/130478 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | 低維度硫族合金之電遷移與擴散行為研究 | zh_TW |
| dc.title | A Study of Electromigration and Diffusion Behaviors of Low-Dimensional Chalcogenides | en_US |
| dc.type | Plan | en_US |
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