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利用金屬壓印技術製作低溫複晶矽薄膜電晶體及擇區奈米碳管(II)

dc.contributor.author吳耀銓en_US
dc.contributor.authorYEWCHUNG SERMONWUen_US
dc.contributor.department交通大學材料科學與工程系zh_TW
dc.date.accessioned2014-12-13T10:31:50Z
dc.date.available2014-12-13T10:31:50Z
dc.date.issued2004en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC93-2216-E009-015zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=1028108&docId=195613en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/91168
dc.language.isozh_TWen_US
dc.title利用金屬壓印技術製作低溫複晶矽薄膜電晶體及擇區奈米碳管(II)zh_TW
dc.titleThe Fabrication of Low Temperature Poly-Si TFT and Selective Area Carbon Nanotubes by Metal Imprint(II)en_US
dc.typePlanen_US

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