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The influence of inserted ZnO underlayer on the growth behavior of a-plane GaN on (001) LaAlO(3)

dc.citation.epage1178en_US
dc.citation.issue8en_US
dc.citation.spage1175en_US
dc.citation.volume312en_US
dc.contributor.authorWang, Wei-Linen_US
dc.contributor.authorHo, Yen-Tengen_US
dc.contributor.authorLiang, Mei-Huien_US
dc.contributor.authorPeng, Chun-Yenen_US
dc.contributor.authorChang, Lien_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.date.accessioned2014-12-08T15:15:26Z
dc.date.available2014-12-08T15:15:26Z
dc.date.issued2010-04-01en_US
dc.description.abstractBoth non-polar a-plane GaN and ZnO films grown on (0 0 1) LaAlO(3) (LAO) substrates consist of orthogonal domain structures. The influence of inserted underlying ZnO on the growth behavior of subsequently grown GaN has been investigated by using transmission electron microscopy and scanning electron microscopy. The size of GaN domains is increased after the incorporation of ZnO underlayer. GaN domains deposited on ZnO/(0 0 1) LAO extend along an in-plane preferential direction which has about 43-45 degrees from [0 0 0 1](GaN). The underlying ZnO results in overgrown GaN domains to locally form r-plane twin structures. (C) 2009 Elsevier B.V. All rights reserved.en_US
dc.identifier.doi10.1016/j.jcrysgro.2009.12.040en_US
dc.identifier.issn0022-0248en_US
dc.identifier.journalJOURNAL OF CRYSTAL GROWTHen_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.jcrysgro.2009.12.040en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/11567
dc.language.isoen_USen_US
dc.titleThe influence of inserted ZnO underlayer on the growth behavior of a-plane GaN on (001) LaAlO(3)en_US
dc.typeArticle; Proceedings Paperen_US

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