高科技製程排氣在真空情況下的細微粒控制技術(I)
| dc.contributor.author | 蔡春進 | en_US |
| dc.contributor.author | Chuen-Jinn Tsai | en_US |
| dc.contributor.department | 國立交通大學環境工程研究所 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:32:58Z | |
| dc.date.available | 2014-12-13T10:32:58Z | |
| dc.date.issued | 2003 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC92-2211-E009-016 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=819576&docId=155122 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/91810 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | 高科技製程排氣在真空情況下的細微粒控制技術(I) | zh_TW |
| dc.title | Fine Particle Control Technology in the Vacuum Exhaust Conditions of Semiconductor Manufacturing Processes(I) | en_US |
| dc.type | Plan | en_US |
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