脈衝雷射蒸鍍高溫超導薄膜之最佳參數之研究(II)

dc.contributor.author	吳光雄	en_US
dc.contributor.author	WU KAUNG-HSIUNG	en_US
dc.contributor.department	交通大學電子物理研究所	zh_TW
dc.date.accessioned	2014-12-13T10:40:53Z
dc.date.available	2014-12-13T10:40:53Z
dc.date.issued	1993	en_US
dc.description.abstract	本計畫係第一年計畫之延續,除了繼續研究蒸鍍YBCO薄膜之條件,以便得到高品質之薄膜外,並將進一步改善自製雷射蒸鍍系統之控制程序,以便提高其可靠性和重複性.所鍍之薄膜將作各種超導特性量測,除作為改善薄膜之重要依據外,並可了解YBCO薄膜之超導物理行為.	zh_TW
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.identifier.govdoc	NSC82-0212-M009-028	zh_TW
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=4405&docId=403	en_US
dc.identifier.uri	https://ir.lib.nycu.edu.tw/handle/11536/97945
dc.language.iso	zh_TW	en_US
dc.subject	雷射蒸鍍	zh_TW
dc.subject	釔系超導薄膜	zh_TW
dc.subject	砷化鎵基板	zh_TW
dc.subject	三層鍍膜	zh_TW
dc.subject	Pulsed laser deposition	en_US
dc.subject	YBCO Thin films	en_US
dc.subject	GaAs Substrate	en_US
dc.subject	Trilayerstructure	en_US
dc.title	脈衝雷射蒸鍍高溫超導薄膜之最佳參數之研究(II)	zh_TW
dc.title	Study the Films Optimum Parameters for Pulsed Laser Deposition of High Tc Superconducting Thin Film(II)	en_US
dc.type	Plan	en_US

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