電漿蝕刻製程的先進製程控制
| dc.contributor.author | 林家瑞 | en_US |
| dc.contributor.author | LIN CHIA-SHUI | en_US |
| dc.contributor.department | 交通大學機械工程系 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:34:46Z | |
| dc.date.available | 2014-12-13T10:34:46Z | |
| dc.date.issued | 2002 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC91-2212-E009-055 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=818538&docId=154885 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/92965 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | 電漿蝕刻製程的先進製程控制 | zh_TW |
| dc.title | Advanced Process Control of Plasma Etching Process | en_US |
| dc.type | Plan | en_US |