複晶矽表面平坦化之新穎製程技術與應用

dc.contributor.author	崔秉鉞	en_US
dc.contributor.author	Bing-YueTsui	en_US
dc.contributor.department	國立交通大學電子工程學系	zh_TW
dc.date.accessioned	2014-12-13T10:33:41Z
dc.date.available	2014-12-13T10:33:41Z
dc.date.issued	2003	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.identifier.govdoc	NSC92-2622-E009-006-CC3	zh_TW
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=825779&docId=156317	en_US
dc.identifier.uri	https://ir.lib.nycu.edu.tw/handle/11536/92199
dc.language.iso	zh_TW	en_US
dc.title	複晶矽表面平坦化之新穎製程技術與應用	zh_TW
dc.title	A Novel Process Technology for Poly-Si Surface Planarization and Its Application	en_US
dc.type	Plan	en_US

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