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薄膜超導元件的研製與特性探討---(A)雷射鍍膜法中臨場監控單層成長超導薄膜製程之研究(B)晶界-薄膜超導元件的研製與特性探討(II)
薄膜超導元件的研製與特性探討---(A)雷射鍍膜法中臨場監控單層成長超導薄膜製程之研究(B)晶界-薄膜超導元件的研製與特性探討(II)
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Date
1995
Authors
郭義雄
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https://www.grb.gov.tw/search/planDetail?id=160898&docId=26758
https://ir.lib.nycu.edu.tw/handle/11536/96781
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