高均勻載子移動率之低溫複晶矽薄膜電晶體研製
| dc.contributor.author | 鄭晃忠 | en_US |
| dc.contributor.author | CHENG HUANG-CHUNG | en_US |
| dc.contributor.department | 國立交通大學電子工程學系 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:39:27Z | |
| dc.date.available | 2014-12-13T10:39:27Z | |
| dc.date.issued | 2001 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC90-2215-E009-068 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=665703&docId=126374 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/96498 | |
| dc.language.iso | zh_TW | en_US |
| dc.subject | 多晶矽 | zh_TW |
| dc.subject | 低溫 | zh_TW |
| dc.subject | 載子移動率 | zh_TW |
| dc.subject | 薄膜電晶體 | zh_TW |
| dc.subject | Poly-silicon | en_US |
| dc.subject | Low temperature | en_US |
| dc.subject | Carrier mobility | en_US |
| dc.subject | Thin film transistor (TFT) | en_US |
| dc.title | 高均勻載子移動率之低溫複晶矽薄膜電晶體研製 | zh_TW |
| dc.title | Fabrication of Uniform and High Mobility Low Temperaturepoly-Si TFTs | en_US |
| dc.type | Plan | en_US |
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