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High-gain complementary inverter with ambipolar thin film transistors and fabrication thereof

dc.citation.patentcountryUSAzh_TW
dc.citation.patentnumber08563974zh_TW
dc.contributor.authorLiu Po-Tsunen_US
dc.contributor.authorChou Yi-Tehen_US
dc.contributor.authorTeng Li-Fengen_US
dc.contributor.authorFu Chur-Shyangen_US
dc.contributor.authorShieh Han-Pingen_US
dc.date.accessioned2014-12-16T06:13:58Z
dc.date.available2014-12-16T06:13:58Z
dc.date.issued2013-10-22en_US
dc.description.abstractThe present invention relates to a high gain complementary inverter with ambipolar thin film transistors and fabrication thereof, comprising: a gate layer, a silica layer, a first active layer, a first source, a first drain, a second active layer, a second source and a second drain for fabrication cost and complexity reduction.zh_TW
dc.identifier.govdocH01L029/10zh_TW
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/104430
dc.language.isozh_TWen_US
dc.titleHigh-gain complementary inverter with ambipolar thin film transistors and fabrication thereofzh_TW
dc.typePatentsen_US

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