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Novel diode structures and ESD protection circuits in a 1.8-V 0.15-mu m partially-depleted SOI salicided CMOS process

dc.citation.epage96en_US
dc.citation.spage91en_US
dc.contributor.authorKer, MDen_US
dc.contributor.authorHung, KKen_US
dc.contributor.authorTang, HTHen_US
dc.contributor.authorHuang, SCen_US
dc.contributor.authorChen, SSen_US
dc.contributor.authorWang, MCen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:26:45Z
dc.date.available2014-12-08T15:26:45Z
dc.date.issued2001en_US
dc.identifier.isbn0-7803-6675-1en_US
dc.identifier.journalPROCEEDINGS OF THE 2001 8TH INTERNATIONAL SYMPOSIUM ON THE PHYSICAL & FAILURE ANALYSIS OF INTEGRATED CIRCUITSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/19016
dc.identifier.wosnumberWOS:000171369600013
dc.language.isoen_USen_US
dc.titleNovel diode structures and ESD protection circuits in a 1.8-V 0.15-mu m partially-depleted SOI salicided CMOS processen_US
dc.typeProceedings Paperen_US

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