鋁膜中摻雜 Si及Cu對其陽極氧化薄膜生成之影響及其在IC上之應用

dc.contributor.author	張秉衡	en_US
dc.contributor.department	國立交通大學材料科學工程研究所	zh_TW
dc.date.accessioned	2014-12-13T10:39:14Z
dc.date.available	2014-12-13T10:39:14Z
dc.date.issued	1995	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.identifier.govdoc	NSC84-2215-E009-047	zh_TW
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=172243&docId=29265	en_US
dc.identifier.uri	https://ir.lib.nycu.edu.tw/handle/11536/96234
dc.language.iso	zh_TW	en_US
dc.title	鋁膜中摻雜 Si及Cu對其陽極氧化薄膜生成之影響及其在IC上之應用	zh_TW
dc.title	Effect of Si and Cu Doping on the Anodic Oxide Formation of Al Thin Films and Their IC Applications	en_US
dc.type	Plan	en_US

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