Exposure schedule for multiplexing holograms in photopolymer
| dc.citation.epage | 106 | en_US |
| dc.citation.spage | 100 | en_US |
| dc.citation.volume | 3801 | en_US |
| dc.contributor.author | Lin, SAH | en_US |
| dc.contributor.author | Hsu, KY | en_US |
| dc.contributor.author | Chen, WZ | en_US |
| dc.contributor.author | Whang, WT | en_US |
| dc.contributor.department | 光電工程學系 | zh_TW |
| dc.contributor.department | Department of Photonics | en_US |
| dc.date.accessioned | 2014-12-08T15:27:09Z | |
| dc.date.available | 2014-12-08T15:27:09Z | |
| dc.date.issued | 1999 | en_US |
| dc.description.abstract | We present dynamics of the grating formation process in phenanthrenequinone- (PQ-) doped poly(methyl methacrylate) (PMMA) photo-polymer. The exposure schedule for multiplexing holograms to achieve equal-strength storage in a single location is described. The analysis method is valid for any saturated media, thus the results can be applied to other photo-polymer materials with similar kinetics. | en_US |
| dc.identifier.doi | 10.1117/12.363923 | en_US |
| dc.identifier.isbn | 0-8194-3287-3 | en_US |
| dc.identifier.issn | 0277-786X | en_US |
| dc.identifier.journal | PHOTOREFRACTIVE FIBER AND CRYSTAL DEVICES: MATERIALS, OPTICAL PROPERTIES, AND APPLICATIONS V | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1117/12.363923 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/19387 | |
| dc.identifier.wosnumber | WOS:000083314900012 | |
| dc.language.iso | en_US | en_US |
| dc.subject | photopolymer material | en_US |
| dc.subject | PMMA | en_US |
| dc.subject | Holographic data storage | en_US |
| dc.subject | multiplexing schedule | en_US |
| dc.subject | dynamic range | en_US |
| dc.title | Exposure schedule for multiplexing holograms in photopolymer | en_US |
| dc.type | Proceedings Paper | en_US |