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Ion-channeling studies of InAs/GaAs quantum dots

dc.citation.epage474en_US
dc.citation.issue1-4en_US
dc.citation.spage470en_US
dc.citation.volume241en_US
dc.contributor.authorNiu, Hen_US
dc.contributor.authorChen, CHen_US
dc.contributor.authorWang, HYen_US
dc.contributor.authorWu, SCen_US
dc.contributor.authorLee, CPen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:18:00Z
dc.date.available2014-12-08T15:18:00Z
dc.date.issued2005-12-01en_US
dc.description.abstractDetermination of the strains in and around the quantum dots is important both to assess the results of the epitaxially grown thin film and to explain the optical performance of quantum dots samples. A series of InAs/GaAs quantum dots samples were fabricated by MBE in Stranski-Krastanov growth mode. The preliminary results of ion-channeling observations along < 001 > growth direction and < 011 > direction will be presented and discussed briefly. (c) 2005 Elsevier B.V. All rights reserved.en_US
dc.identifier.doi10.1016/j.nimb.2005.07.094en_US
dc.identifier.issn0168-583Xen_US
dc.identifier.journalNUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMSen_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.nimb.2005.07.094en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/13010
dc.identifier.wosnumberWOS:000234260000099
dc.language.isoen_USen_US
dc.subjectquantum dotsen_US
dc.subjectGaAsen_US
dc.subjectInAsen_US
dc.subjection-channelingen_US
dc.titleIon-channeling studies of InAs/GaAs quantum dotsen_US
dc.typeArticle; Proceedings Paperen_US

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