光資訊關鍵性材料製程與性質研究---子計畫V:用晶圓接合與溼式蝕刻方式來剝離側向覆蓋生長之氮化鎵磊晶層(II)

dc.contributor.author吳耀銓en_US
dc.contributor.authorYEWCHUNG SERMONWUen_US
dc.contributor.department國立交通大學材料科學與工程學系zh_TW
dc.date.accessioned2014-12-13T10:33:25Z
dc.date.available2014-12-13T10:33:25Z
dc.date.issued2003en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC92-2216-E009-012zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=828332&docId=156981en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/92055
dc.language.isozh_TWen_US
dc.title光資訊關鍵性材料製程與性質研究---子計畫V:用晶圓接合與溼式蝕刻方式來剝離側向覆蓋生長之氮化鎵磊晶層(II)zh_TW
dc.titleLift off GaN Epitaxy Lateral Overgrowth Layer by Wafer Bonding and Wet Etching Methods (II)en_US
dc.typePlanen_US

Files

Original bundle

Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
922216E009012.pdf
Size:
107.61 KB
Format:
Adobe Portable Document Format

License bundle

Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
license.txt
Size:
1.71 KB
Format:
Item-specific license agreed to upon submission
Description: