Approach to room temperature process - A novel thin liquid-phase deposited oxide

dc.citation.epage	160	en_US
dc.citation.issue	18	en_US
dc.citation.spage	149	en_US
dc.citation.volume	96	en_US
dc.contributor.author	Yeh, CF	en_US
dc.contributor.author	Lin, SS	en_US
dc.contributor.department	交大名義發表	zh_TW
dc.contributor.department	電子工程學系及電子研究所	zh_TW
dc.contributor.department	National Chiao Tung University	en_US
dc.contributor.department	Department of Electronics Engineering and Institute of Electronics	en_US
dc.date.accessioned	2014-12-08T15:27:40Z
dc.date.available	2014-12-08T15:27:40Z
dc.date.issued	1996	en_US
dc.description.abstract	To continuously reduce dimensions, and increase reliability of devices, low-temperature process (LTP) is an important issue. Pursuing a novel LTP, room-temperature process can be as a norm. In this paper, as an approach to room-temperature process, the feasible technologies of versatile liquid-phase deposited oxide will be introduced.	en_US
dc.identifier.isbn	1-56677-168-4	en_US
dc.identifier.journal	PROCEEDINGS OF THE SYMPOSIUM ON SURFACE OXIDE FILMS	en_US
dc.identifier.uri	https://ir.lib.nycu.edu.tw/handle/11536/19926
dc.identifier.wosnumber	WOS:A1996BG91H00015
dc.language.iso	en_US	en_US
dc.title	Approach to room temperature process - A novel thin liquid-phase deposited oxide	en_US
dc.type	Proceedings Paper	en_US

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