Process for fabricating supersphere solid immersion lens
| dc.citation.patentcountry | USA | zh_TW |
| dc.citation.patentnumber | 20050196708 | zh_TW |
| dc.contributor.author | Hsu, Wensyang | en_US |
| dc.contributor.author | Sun, Yi-Ting | en_US |
| dc.date.accessioned | 2014-12-16T06:16:16Z | |
| dc.date.available | 2014-12-16T06:16:16Z | |
| dc.date.issued | 2005-09-08 | en_US |
| dc.description.abstract | The present invention relates to process for fabricating supersphere solid immersion lens (SSIL). The procedure of the present invention comprises the steps of: firstly, coating a positive photoresist layer on a substrate, followed by first exposure and second exposure with different exposure dose separately by first mask and second mask to form the positive photoresist structure with different dimensions and depths. The first exposure dose is supplied enough to make sure the patterns of the first mask can be observed on the positive photoresist layer during the alignment of the second exposure process. And the following reflow process forms a supersphere solid immersion lens (SSIL) structure. | zh_TW |
| dc.identifier.govdoc | G02B003/00 | zh_TW |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/105729 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | Process for fabricating supersphere solid immersion lens | zh_TW |
| dc.type | Patents | en_US |