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DESIGN OF 2xV(DD) LOGIC GATES WITH ONLY 1xV(DD) DEVICES IN NANOSCALE CMOS TECHNOLOGY

dc.citation.epage36en_US
dc.citation.spage33en_US
dc.citation.woscount0en_US
dc.contributor.authorChiu, Po-Yenen_US
dc.contributor.authorKer, Ming-Douen_US
dc.contributor.department電機學院zh_TW
dc.contributor.departmentCollege of Electrical and Computer Engineeringen_US
dc.date.accessioned2015-07-21T08:31:00Z
dc.date.available2015-07-21T08:31:00Z
dc.date.issued2013-01-01en_US
dc.description.abstractThe novel 2xV(DD) NOT, NAND, and NOR logic gates have been designed and implemented in a nanoscale CMOS process with only 1xV(DD) devices. With the proposed dynamic source bias technique, the logic gates can be designed to have 2xV(DD) tolerant capability. Thus, the new 2xV(DD) logic gates can be operated under 2xV(DD) voltage environment without suffering the gate-oxide reliability issue.en_US
dc.identifier.isbn978-1-4799-1166-0en_US
dc.identifier.issn2164-1676en_US
dc.identifier.journal2013 IEEE 26TH INTERNATIONAL SOC CONFERENCE (SOCC)en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/125063
dc.identifier.wosnumberWOS:000351736000001en_US
dc.language.isoen_USen_US
dc.titleDESIGN OF 2xV(DD) LOGIC GATES WITH ONLY 1xV(DD) DEVICES IN NANOSCALE CMOS TECHNOLOGYen_US
dc.typeProceedings Paperen_US

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