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以氫化物氣相磊晶法開發III-V族氮化物基板( II )

dc.contributor.author李威儀en_US
dc.contributor.authorLEE WEI-Ien_US
dc.contributor.department國立交通大學電子物理學系(所)zh_TW
dc.date.accessioned2014-12-13T10:49:53Z
dc.date.available2014-12-13T10:49:53Z
dc.date.issued2008en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC97-2622-E009-002zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=1630473&docId=278550en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/101884
dc.language.isozh_TWen_US
dc.title以氫化物氣相磊晶法開發III-V族氮化物基板( II )zh_TW
dc.titleIII-V Group Nitride Base Substrates Developed by Hydride Vapor Phase Epitaxy(II)en_US
dc.typePlanen_US

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