Fast-Converging Iterative Gradient Decent Methods for High Pattern Fidelity Inverse Mask Design
| dc.citation.volume | 7640 | en_US |
| dc.contributor.author | Yu, Jue-Chin | en_US |
| dc.contributor.author | Yu, Peichen | en_US |
| dc.contributor.department | 光電工程學系 | zh_TW |
| dc.contributor.department | Department of Photonics | en_US |
| dc.date.accessioned | 2014-12-08T15:23:28Z | |
| dc.date.available | 2014-12-08T15:23:28Z | |
| dc.date.issued | 2010 | en_US |
| dc.description.abstract | Convergence speed and local minimum issue have been the major issues for inverse lithography. In this paper, we propose an inverse algorithm that employs an iterative gradient-descent method to improve convergence and reduce the Edge Placement Error (EPE). The algorithm employs a constrained gradient-based optimization to attain the fast converging speed, while a cross-weighting technique is introduced to overcome the local minimum trapping. | en_US |
| dc.identifier.doi | 10.1117/12.846568 | en_US |
| dc.identifier.isbn | 978-0-8194-8054-5 | en_US |
| dc.identifier.issn | 0277-786X | en_US |
| dc.identifier.journal | OPTICAL MICROLITHOGRAPHY XXIII | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1117/12.846568 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/16433 | |
| dc.identifier.wosnumber | WOS:000285084400086 | |
| dc.language.iso | en_US | en_US |
| dc.subject | optical proximity correction | en_US |
| dc.subject | inverse lithography | en_US |
| dc.subject | image gradient | en_US |
| dc.title | Fast-Converging Iterative Gradient Decent Methods for High Pattern Fidelity Inverse Mask Design | en_US |
| dc.type | Article | en_US |