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利用連續波雷射結晶法製作低溫複晶矽薄膜電晶體之製程開發及其在面板系統整合上之應用---子計畫一:以連續波雷射法製作高效能低溫腹晶矽薄膜電晶體之製程開發(III)

dc.contributor.author鄭晃忠en_US
dc.contributor.authorCHENG HUANG-CHUNGen_US
dc.contributor.department交通大學電子工程系zh_TW
dc.date.accessioned2014-12-13T10:29:28Z
dc.date.available2014-12-13T10:29:28Z
dc.date.issued2006en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC95-2221-E009-253zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=1309445&docId=241972en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/89332
dc.language.isozh_TWen_US
dc.title利用連續波雷射結晶法製作低溫複晶矽薄膜電晶體之製程開發及其在面板系統整合上之應用---子計畫一:以連續波雷射法製作高效能低溫腹晶矽薄膜電晶體之製程開發(III)zh_TW
dc.titleProcess Developement of High Performance Low Temperature Polycrystalline Silicon by Continuous-Wave Laser Crystallization(III)en_US
dc.typePlanen_US

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