FABRICATION METHOD FOR TWO-DIMENSIONAL MATERIALS
| dc.citation.patentcountry | USA | en_US |
| dc.citation.patentnumber | 20180291508 | en_US |
| dc.contributor.author | Tuo-Hung HOU | en_US |
| dc.contributor.author | Jyun-Hong Huang | en_US |
| dc.date.accessioned | 2019-04-11T06:08:28Z | |
| dc.date.available | 2019-04-11T06:08:28Z | |
| dc.date.issued | 2018-10-11 | en_US |
| dc.description.abstract | A fabrication method for two-dimensional materials of the present invention includes the following steps: forming a thin film having at least one two-dimensional element on a substrate; forming at least one capping layer on the thin film; annealing the thin film to form a two-dimensional material film after the capping layer is formed. | en_US |
| dc.identifier.govdoc | C23C016/50 | en_US |
| dc.identifier.govdoc | C23C016/56 | en_US |
| dc.identifier.govdoc | C23C016/52 | en_US |
| dc.identifier.govdoc | C23C016/448 | en_US |
| dc.identifier.govdoc | C23C014/34 | en_US |
| dc.identifier.govdoc | C23C014/24 | en_US |
| dc.identifier.govdoc | C23C014/06 | en_US |
| dc.identifier.govdoc | C23C014/58 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/151441 | |
| dc.language.iso | en_US | en_US |
| dc.title | FABRICATION METHOD FOR TWO-DIMENSIONAL MATERIALS | en_US |
| dc.type | Patents | en_US |