Preparation and characterization of new low-dielectric thin-film materials with fluorine.
| dc.citation.epage | U88 | en_US |
| dc.citation.issue | en_US | |
| dc.citation.spage | U88 | en_US |
| dc.citation.volume | 225 | en_US |
| dc.contributor.author | Chuang, SH | en_US |
| dc.contributor.author | Wan, CY | en_US |
| dc.contributor.author | Chiu, HT | en_US |
| dc.contributor.department | 應用化學系 | zh_TW |
| dc.contributor.department | Department of Applied Chemistry | en_US |
| dc.date.accessioned | 2014-12-08T15:41:17Z | |
| dc.date.available | 2014-12-08T15:41:17Z | |
| dc.date.issued | 2003-03-01 | en_US |
| dc.identifier.issn | 0065-7727 | en_US |
| dc.identifier.journal | ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/28078 | |
| dc.identifier.wosnumber | WOS:000187918000505 | |
| dc.language.iso | en_US | en_US |
| dc.title | Preparation and characterization of new low-dielectric thin-film materials with fluorine. | en_US |
| dc.type | Meeting Abstract | en_US |
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