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Bipolar resistive switching characteristics of Gd2O3 thin film structure

dc.citation.epage144en_US
dc.citation.issue3en_US
dc.citation.spage137en_US
dc.citation.volume35en_US
dc.contributor.authorChang, K. M.en_US
dc.contributor.authorTzeng, W. H.en_US
dc.contributor.authorLiu, K. C.en_US
dc.contributor.authorChan, Y. C.en_US
dc.contributor.authorKuo, C. C.en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:28:06Z
dc.date.available2014-12-08T15:28:06Z
dc.date.issued2011en_US
dc.description.abstractThe resistive switching (RS) behavior of the Ti/Gd2O3/Pt capacitor structure is fabricated and discussed in this paper. The switching characteristics operated under positive bias exhibits stable switching properties with a condensed voltage and resistance values dispersion, while the switching characteristics becomes unstable and large fluctuation on switching parameters under the negative bias operation. We suggest that the anode electrode plays an important role to the switching characteristics, and might be the causes of the asymmetry of the I-V curves between positive and negative operation. Constant voltage stress measurement is also tested to reveal the switching mechanism of the Gd2O3 film, and the switching mechanism is mainly based on the applied voltage and thermal Joule heat.en_US
dc.identifier.doi10.1149/1.3569906en_US
dc.identifier.isbn978-1-60768-214-1en_US
dc.identifier.issn1938-5862en_US
dc.identifier.journalDIELECTRICS IN NANOSYSTEMS -AND- GRAPHENE, GE/III-V, NANOWIRES AND EMERGING MATERIALS FOR POST-CMOS APPLICATIONS 3en_US
dc.identifier.urihttp://dx.doi.org/10.1149/1.3569906en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/20363
dc.identifier.wosnumberWOS:000309539300011
dc.language.isoen_USen_US
dc.titleBipolar resistive switching characteristics of Gd2O3 thin film structureen_US
dc.typeProceedings Paperen_US

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