RAPID THERMAL-OXIDATION OF LIGHTLY DOPED SILICON IN N2O
| dc.citation.epage | 186 | en_US |
| dc.citation.spage | 181 | en_US |
| dc.citation.volume | 342 | en_US |
| dc.contributor.author | SUN, SC | en_US |
| dc.contributor.author | WANG, LS | en_US |
| dc.contributor.author | YEH, FL | en_US |
| dc.contributor.author | LAI, TS | en_US |
| dc.contributor.author | LIN, YH | en_US |
| dc.contributor.department | 奈米中心 | zh_TW |
| dc.contributor.department | Nano Facility Center | en_US |
| dc.date.accessioned | 2014-12-08T15:27:53Z | |
| dc.date.available | 2014-12-08T15:27:53Z | |
| dc.date.issued | 1994 | en_US |
| dc.identifier.isbn | 1-55899-242-1 | en_US |
| dc.identifier.issn | 0272-9172 | en_US |
| dc.identifier.journal | RAPID THERMAL AND INTEGRATED PROCESSING III | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/20140 | |
| dc.identifier.wosnumber | WOS:A1994BB24P00025 | |
| dc.language.iso | en_US | en_US |
| dc.title | RAPID THERMAL-OXIDATION OF LIGHTLY DOPED SILICON IN N2O | en_US |
| dc.type | Proceedings Paper | en_US |
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