Nickel silicide nanocrystals embedded in SiO2 and HfO2 for nonvolatile memory application
| dc.citation.epage | 363 | en_US |
| dc.citation.issue | 2-4 | en_US |
| dc.citation.spage | 360 | en_US |
| dc.citation.volume | 516 | en_US |
| dc.contributor.author | Yang, F. M. | en_US |
| dc.contributor.author | Chang, T. C. | en_US |
| dc.contributor.author | Liu, Po-Tsun | en_US |
| dc.contributor.author | Yeh, Y. H. | en_US |
| dc.contributor.author | Yu, Y. C. | en_US |
| dc.contributor.author | Lin, J. Y. | en_US |
| dc.contributor.author | Sze, S. M. | en_US |
| dc.contributor.author | Lou, J. C. | en_US |
| dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
| dc.contributor.department | 光電工程學系 | zh_TW |
| dc.contributor.department | 顯示科技研究所 | zh_TW |
| dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
| dc.contributor.department | Department of Photonics | en_US |
| dc.contributor.department | Institute of Display | en_US |
| dc.date.accessioned | 2014-12-08T15:05:12Z | |
| dc.date.available | 2014-12-08T15:05:12Z | |
| dc.date.issued | 2007-12-03 | en_US |
| dc.description.abstract | In this study, a nonvolatile memory device with NiSi2 nanocrystals embedded in the SiO2 and HfO2 layer has been fabricated. A significant memory effect is observed during the characterization of the electrical properties. When a low operating voltage, 4 V, is applied, a significant threshold voltage shift of 1.3 V, is observed. The processing of this structure is compatible with the current manufacturing technology of semiconductor industry. (C) 2007 Published by Elsevier B.V. | en_US |
| dc.identifier.doi | 10.1016/j.tsf.2007.06.131 | en_US |
| dc.identifier.issn | 0040-6090 | en_US |
| dc.identifier.journal | THIN SOLID FILMS | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1016/j.tsf.2007.06.131 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/3741 | |
| dc.identifier.wosnumber | WOS:000252037500048 | |
| dc.language.iso | en_US | en_US |
| dc.subject | nonvolatile memory | en_US |
| dc.subject | nanocrystals | en_US |
| dc.subject | HfO2 | en_US |
| dc.title | Nickel silicide nanocrystals embedded in SiO2 and HfO2 for nonvolatile memory application | en_US |
| dc.type | Article; Proceedings Paper | en_US |