SIMULATION STUDY OF A NEW PHASE-SHIFTING MASK - HALFTONE-RIM
| dc.citation.epage | 457 | en_US |
| dc.citation.spage | 448 | en_US |
| dc.citation.volume | 2440 | en_US |
| dc.contributor.author | LOONG, WA | en_US |
| dc.contributor.author | YEH, CH | en_US |
| dc.contributor.author | SHY, SL | en_US |
| dc.contributor.department | 應用化學系 | zh_TW |
| dc.contributor.department | Department of Applied Chemistry | en_US |
| dc.date.accessioned | 2014-12-08T15:27:43Z | |
| dc.date.available | 2014-12-08T15:27:43Z | |
| dc.date.issued | 1995 | en_US |
| dc.identifier.doi | 10.1117/12.209275 | en_US |
| dc.identifier.isbn | 0-8194-1788-2 | en_US |
| dc.identifier.journal | OPTICAL/LASER MICROLITHOGRAPHY VIII | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1117/12.209275 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/19976 | |
| dc.identifier.wosnumber | WOS:A1995BD19S00039 | |
| dc.language.iso | en_US | en_US |
| dc.subject | PHASE-SHIFTING MASK | en_US |
| dc.subject | HALF-TONE | en_US |
| dc.subject | RIM | en_US |
| dc.subject | HALF-TONE-RIM | en_US |
| dc.subject | SIMULATION | en_US |
| dc.subject | OFF-AXIS ILLUMINATION | en_US |
| dc.subject | SUBMICRON LITHOGRAPHY | en_US |
| dc.title | SIMULATION STUDY OF A NEW PHASE-SHIFTING MASK - HALFTONE-RIM | en_US |
| dc.type | Proceedings Paper | en_US |