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Growth of the large area horizontally-aligned carbon nanotubes by ECR-CVD

dc.citation.epage229en_US
dc.citation.issueen_US
dc.citation.spage225en_US
dc.citation.volume420en_US
dc.contributor.authorHsu, CMen_US
dc.contributor.authorLin, CHen_US
dc.contributor.authorChang, HLen_US
dc.contributor.authorKuo, CTen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.date.accessioned2014-12-08T15:41:38Z
dc.date.available2014-12-08T15:41:38Z
dc.date.issued2002-12-02en_US
dc.description.abstractFor potential applications of carbon nanotubes (CNTs) as connectors in microelectronic devices, the process to synthesize the large area horizontally-aligned CNTs on 100 mm (4 inch) Si wafers was developed, using electron cyclotron resonance chemical vapor deposition, with CH, and H, as the source gases and Co as the catalyst. The results show that vertical and horizontal CNTs can be obtained by manipulating the electric field applied on the substrate and flow direction of the gases. In the present deposition conditions, the horizontal CNTs show better field emission properties than vertical CNTs. This may be due to the blocking effect of catalysts at the tips and to the diminishment of the effective emission area from defects of vertical CNTs body. (C) 2002 Elsevier Science B.V. All rights reserved.en_US
dc.identifier.doi10.1016/S0040-6090(02)00799-Xen_US
dc.identifier.issn0040-6090en_US
dc.identifier.journalTHIN SOLID FILMSen_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0040-6090(02)00799-Xen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/28321
dc.identifier.wosnumberWOS:000179922500038
dc.language.isoen_USen_US
dc.subjectchemical vapor depositionen_US
dc.subjectfield emissionen_US
dc.subjectcarbonen_US
dc.subjectscanning electron microscopyen_US
dc.titleGrowth of the large area horizontally-aligned carbon nanotubes by ECR-CVDen_US
dc.typeArticle; Proceedings Paperen_US

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