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Substrate bias effect on amorphous nitrogenated carbon films deposited by filtered arc deposition

dc.citation.epage1233en_US
dc.citation.issue3-6en_US
dc.citation.spage1227en_US
dc.citation.volume11en_US
dc.contributor.authorLi, YWen_US
dc.contributor.authorShue, YBen_US
dc.contributor.authorChen, CFen_US
dc.contributor.authorYu, TCen_US
dc.contributor.authorChang, JJKen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.date.accessioned2014-12-08T15:42:45Z
dc.date.available2014-12-08T15:42:45Z
dc.date.issued2002-03-01en_US
dc.description.abstractThe effect of substrate bias and nitrogen incorporation on the structure and hardness properties of amorphous carbon (a-C) films is characterized in terms of its composition, sp(3) bonding fraction, and Raman spectra. The films' properties were analyzed using Raman spectroscopy, Auger electron spectroscopy (AES), and nanoindentation system (NIS). Experimental results indicate that a-C films were found to possess the highest hardness when deposited at a substrate bias ranging from -50 to -100 V. In addition, the hardness values do not correlate well with the Raman I(D)/I(G) ratio. The hardness of films increases with their sp(3) bonds fraction. Furthermore, nitrogen content increases with increasing substrate bias on amorphous nitrogenated carbon (a-C:N) films, and influences the growth of small graphitic crystallines. (C) 2002 Elsevier Science B.V. All rights reserved.en_US
dc.identifier.doi10.1016/S0925-9635(01)00624-0en_US
dc.identifier.issn0925-9635en_US
dc.identifier.journalDIAMOND AND RELATED MATERIALSen_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0925-9635(01)00624-0en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/28980
dc.identifier.wosnumberWOS:000176046300189
dc.language.isoen_USen_US
dc.subjectfiltered arc depositionen_US
dc.subjectamorphous-carbonen_US
dc.subjectnitrogenen_US
dc.subjectbiasen_US
dc.subjecthardnesssen_US
dc.titleSubstrate bias effect on amorphous nitrogenated carbon films deposited by filtered arc depositionen_US
dc.typeArticle; Proceedings Paperen_US

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