Immersion Lithography Apparatus and Tank Thereof
| dc.citation.patentcountry | USA | zh_TW |
| dc.citation.patentnumber | 20100083899 | zh_TW |
| dc.contributor.author | Hung, Kuo-Yung | en_US |
| dc.contributor.author | Tseng, Fan-Gang | en_US |
| dc.date.accessioned | 2014-12-16T06:15:38Z | |
| dc.date.available | 2014-12-16T06:15:38Z | |
| dc.date.issued | 2010-04-08 | en_US |
| dc.description.abstract | A tank for an immersion lithography apparatus provided. The tank has a container with a bottom plate and side plates connected to each, wherein the side plates surround and connect all edges of the bottom plate. The container is filled in at least a liquid having a refractive index thereof from about 1.4 to about 1.8. A platform is located in the container and immersed in the liquid. The platform has an axle fastened on a side thereof parallel to the bottom plate, wherein the axle passes through a bearing hole penetrated through one of the side plates. A roller disposed outside the container connects to the axle to rotate the axle, and furthermore, to incline the platform accordingly. | zh_TW |
| dc.identifier.govdoc | B05C003/02 | zh_TW |
| dc.identifier.govdoc | B05C011/11 | zh_TW |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/105425 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | Immersion Lithography Apparatus and Tank Thereof | zh_TW |
| dc.type | Patents | en_US |