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以微電鍍法製作次微米孔穴的研究

dc.contributor.author徐文祥en_US
dc.contributor.authorHSU WENSYANGen_US
dc.contributor.department國立交通大學機械工程學系zh_TW
dc.date.accessioned2014-12-13T10:35:43Z
dc.date.available2014-12-13T10:35:43Z
dc.date.issued2001en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC90-2212-E009-033zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=645475&docId=121268en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/93556
dc.language.isozh_TWen_US
dc.subject微電鍍zh_TW
dc.subject次微米孔穴zh_TW
dc.subject製造zh_TW
dc.subjectMicro electroplatingen_US
dc.subjectSub-micro apertureen_US
dc.subjectFabricationen_US
dc.title以微電鍍法製作次微米孔穴的研究zh_TW
dc.titleFabrication of Sub-Micro Aperture by Micro Electroplatingen_US
dc.typePlanen_US

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