The Impact of Uniaxial Strain on Low Frequency Noise of Nanoscale PMOSFETs with e-SiGe and i-SiGe Source/Drain
| dc.contributor.author | Yeh, Kuo-Liang | en_US |
| dc.contributor.author | Hong, Wei-Lun | en_US |
| dc.contributor.author | Guo, Jyh-Chyurn | en_US |
| dc.contributor.department | 交大名義發表 | zh_TW |
| dc.contributor.department | National Chiao Tung University | en_US |
| dc.date.accessioned | 2014-12-08T15:39:00Z | |
| dc.date.available | 2014-12-08T15:39:00Z | |
| dc.date.issued | 2010 | en_US |
| dc.identifier.isbn | 978-1-4244-6057-1 | en_US |
| dc.identifier.issn | 0149-645X | en_US |
| dc.identifier.journal | 2010 IEEE MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM DIGEST (MTT) | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/26698 | |
| dc.identifier.wosnumber | WOS:000288196502125 | |
| dc.language.iso | en_US | en_US |
| dc.title | The Impact of Uniaxial Strain on Low Frequency Noise of Nanoscale PMOSFETs with e-SiGe and i-SiGe Source/Drain | en_US |
| dc.type | Meeting Abstract | en_US |
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