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Fermi and anti-Fermi glass transition and subband resonant quantum tunneling in Nb/Ti metallic multilayer films

dc.citation.epage344en_US
dc.citation.issue2en_US
dc.citation.spage339en_US
dc.citation.volume38en_US
dc.contributor.authorLue, JTen_US
dc.contributor.authorLiang, SYen_US
dc.contributor.authorLee, YWen_US
dc.contributor.authorLue, HTen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:45:32Z
dc.date.available2014-12-08T15:45:32Z
dc.date.issued2000-04-01en_US
dc.description.abstractMultilayer of Nb/Ti and NbN/Ti films with 30 periodic structure were sputtered onto silicon substrates. The current-voltage characteristics measured along the vertical junction at low temperatures exhibit nonlinear step-wise curves. The resonant subband quantum tunneling in the metallic multiple quantum wells can satisfactorily express these peculiar behaviors. The Fermi and anti-Fermi glass transition showing itinerant metallic and insulating conduction properties are also observed at low currents and near critical temperatures.en_US
dc.identifier.issn0577-9073en_US
dc.identifier.journalCHINESE JOURNAL OF PHYSICSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/30633
dc.identifier.wosnumberWOS:000086700400020
dc.language.isoen_USen_US
dc.titleFermi and anti-Fermi glass transition and subband resonant quantum tunneling in Nb/Ti metallic multilayer filmsen_US
dc.typeArticle; Proceedings Paperen_US

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