以電子迴旋共振化學氣相沈積技術成長超薄閘極絕緣膜及可靠性之研究(III)
| dc.contributor.author | 張國明 | en_US |
| dc.contributor.author | CHANG KOW-MING | en_US |
| dc.contributor.department | 交通大學電子工程系 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:34:25Z | |
| dc.date.available | 2014-12-13T10:34:25Z | |
| dc.date.issued | 2002 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC91-2215-E009-014 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=736708&docId=139404 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/92719 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | 以電子迴旋共振化學氣相沈積技術成長超薄閘極絕緣膜及可靠性之研究(III) | zh_TW |
| dc.title | Fabrication and Reliability of Ultra-Thin Gate Dielectrics by ECR-CVD Technique (III) | en_US |
| dc.type | Plan | en_US |