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功率增益截止頻率高於100GHz之高頻氮化鋁/氮化鎵高電子遷移率電晶體技術開發與研究

dc.contributor.author張翼en_US
dc.contributor.authorCHANG EDWARD YIen_US
dc.contributor.department國立交通大學材料科學與工程學系(所)zh_TW
dc.date.accessioned2014-12-13T10:42:46Z
dc.date.available2014-12-13T10:42:46Z
dc.date.issued2014en_US
dc.description.sponsorship科技部zh_TW
dc.identifier.govdocNSC102-2221-E009-095-MY2zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=8125233&docId=433553en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/99371
dc.language.isozh_TWen_US
dc.title功率增益截止頻率高於100GHz之高頻氮化鋁/氮化鎵高電子遷移率電晶體技術開發與研究zh_TW
dc.titleDevelopment and Research of AlN/GaN HEMT with Fmax 100GHz for High Frequency Applicationsen_US
dc.typePlanen_US

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