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Sputtering process of carbon nitride films by using a novel bio-molecular C-N containing target

dc.citation.epage79en_US
dc.citation.issue1-2en_US
dc.citation.spage74en_US
dc.citation.volume332en_US
dc.contributor.authorLu, TRen_US
dc.contributor.authorChen, LCen_US
dc.contributor.authorChen, KHen_US
dc.contributor.authorBhusari, DMen_US
dc.contributor.authorChen, TMen_US
dc.contributor.authorKuo, CTen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.date.accessioned2014-12-08T15:47:23Z
dc.date.available2014-12-08T15:47:23Z
dc.date.issued1998-11-02en_US
dc.description.abstractIn order to reduce the activation energy barrier for the formation of carbon nitride during ion beam sputtering, a novel bio-molecular target material, instead of the conventional graphite target, is successfully developed to deposit the crystalline carbon nitride films. The adenine target consists of a high N/C ratio as well as a 6-fold carbonitro-ring structure similar to that in the hypothetical C3N4. The mass spectrum of adenine indicates the existence of 11 main carbonitro-hydrogen containing species. Thus, the adenine target is anticipated to enhance the nucleation and growth of carbon nitride films by providing abundant carbonitro-hydrogen containing species as intermediate states. X-ray photoelectron spectrum analyses of these films indicated the presence of C and N in the films, with high nitrogen to carbon ratio at about 0.48. Both infrared and Raman spectroscopies confirm the chemical bonding between the carbon and nitrogen. X-ray and electron diffraction indicates the presence of crystalline carbon nitride in the film. (C) 1998 Elsevier Science S.A. All rights reserved.en_US
dc.identifier.issn0040-6090en_US
dc.identifier.journalTHIN SOLID FILMSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/31764
dc.identifier.wosnumberWOS:000077202500015
dc.language.isoen_USen_US
dc.subjectcarbon nitrideen_US
dc.subjectbio-inorganic targeten_US
dc.subjectmass spectrometryen_US
dc.subjection beam sputteringen_US
dc.titleSputtering process of carbon nitride films by using a novel bio-molecular C-N containing targeten_US
dc.typeArticle; Proceedings Paperen_US

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