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Low temperature growth of carbon nanotubes on printing electrodes by MPCVD

dc.citation.epage201en_US
dc.citation.issue1-2en_US
dc.citation.spage198en_US
dc.citation.volume498en_US
dc.contributor.authorChen, KCen_US
dc.contributor.authorChen, CFen_US
dc.contributor.authorChiang, JSen_US
dc.contributor.authorHwang, CLen_US
dc.contributor.authorChang, YYen_US
dc.contributor.authorLee, CCen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.date.accessioned2014-12-08T15:17:11Z
dc.date.available2014-12-08T15:17:11Z
dc.date.issued2006-03-01en_US
dc.description.abstractIn this work, combination of screen-printing process and microwave plasma enhanced chemical vapor deposition system (MPCVD) was applied to fabricate patterned carbon nanotubes (CNTs) on the cathode electrodes on glass substrates. Solution based Ni catalyst was well-mixed with Ag powders and organic binder materials to forin screen printed paste. CNTs were then grown under the atmosphere Of CH4/H-2 gas mixture below 550 degrees C. In the field emission measurement, the tum-on field was 3.2 V/mu m and uniform electron emission image was also observed. (c) 2005 Elsevier B.V. All rights reserved.en_US
dc.identifier.doi10.1016/j.tsf.2005.07.085en_US
dc.identifier.issn0040-6090en_US
dc.identifier.journalTHIN SOLID FILMSen_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.tsf.2005.07.085en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/12539
dc.identifier.wosnumberWOS:000235270500039
dc.language.isoen_USen_US
dc.subjectcarbon nanotubesen_US
dc.subjectglass substratesen_US
dc.subjectMPCVDen_US
dc.subjectscreen printingen_US
dc.titleLow temperature growth of carbon nanotubes on printing electrodes by MPCVDen_US
dc.typeArticle; Proceedings Paperen_US

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