<link rel="stylesheet" href="styles.cf390c6bfbe7555f.css"> Skip to main content

介電質熔絲型記憶電路及其操作方法

dc.citation.patentcountryTWNen_US
dc.citation.patentnumber201711048en_US
dc.contributor.author莊紹勳zh_TW
dc.contributor.author謝易叡zh_TW
dc.contributor.author黃智宏zh_TW
dc.date.accessioned2019-04-11T05:51:38Z
dc.date.available2019-04-11T05:51:38Z
dc.date.issued2017-03-16en_US
dc.description.abstract本發明提出一種可一次性寫入並重複隨機讀取的積體電路記憶體,此記憶體係利用介電質熔絲的方式,作為儲存元件的寫入操作,其主要特徵為,施加一電場於介電質使得其內之離子被析出或介電質熔毀,造成介電質結構損壞,呈穿孔狀,經由介電質穿隧的電流將由寫入前的高電導(低電阻)態轉變為低電導(高電阻)態,此機制已整合於超大型積體電路中完成積體電路記憶體之驗證,並利用CMOS製程實現之。zh_TW
dc.identifier.govdocG11C017/14en_US
dc.identifier.govdocG11C005/06en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/151341
dc.language.isozh_TWen_US
dc.title介電質熔絲型記憶電路及其操作方法zh_TW
dc.typePatentsen_US

Files

Original bundle

Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
201711048.pdf
Size:
3.05 MB
Format:
Adobe Portable Document Format

License bundle

Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
license.txt
Size:
1.71 KB
Format:
Item-specific license agreed to upon submission
Description: