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Tunable growth of ZnO nanorods synthesized in aqueous solutions at low temperatures

dc.citation.epage291en_US
dc.citation.issue1en_US
dc.citation.spage288en_US
dc.citation.volume24en_US
dc.contributor.authorHsiao, CSen_US
dc.contributor.authorPeng, CHen_US
dc.contributor.authorChen, SYen_US
dc.contributor.authorLiou, SCen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.date.accessioned2014-12-08T15:17:50Z
dc.date.available2014-12-08T15:17:50Z
dc.date.issued2006-01-01en_US
dc.description.abstractHighly arrayed ZnO nanorods were fabricated on the Si substrate buffered with patterned ZnO film (ZnOf/Si) via wet-chemical process. The growth behavior and morphology of single-crystal ZnO nanorods (ZNs) were investigated in terms of the annealing temperatures of the sputtered ZnO film. We found that the growth morphology of ZnO nanorods is strongly dominated by the grain size of the ZnO film on the Si substrate. The ZnOf/Si substrate was annealed at above a critical temperature to promote the crystallization of ZnO phase, and high-resolution transmission electron microscopy demonstrated that both ZNs and ZnOf on Si substrate are coherent. Furthermore, the ZNs seem to nucleate from the concave tip near the grain boundary between two ZnO grains in the ZnO film because of higher surface energy. However, a higher annealing temperature may lead to the formation of a larger ZnO crystal due to the coplanar coalescence behavior of several individual ZnO nanorods. (c) 2006 American Vacuum Society.en_US
dc.identifier.doi10.1116/1.2163889en_US
dc.identifier.issn1071-1023en_US
dc.identifier.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ben_US
dc.identifier.urihttp://dx.doi.org/10.1116/1.2163889en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/12931
dc.identifier.wosnumberWOS:000235845900052
dc.language.isoen_USen_US
dc.titleTunable growth of ZnO nanorods synthesized in aqueous solutions at low temperaturesen_US
dc.typeArticle; Proceedings Paperen_US

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