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銅與低介電材料介電層之系統整合及可靠度提升研究(II)

dc.contributor.author邱碧秀en_US
dc.contributor.authorCHIOU BI-SHIOUen_US
dc.contributor.department國立交通大學電子工程學系zh_TW
dc.date.accessioned2014-12-13T10:33:39Z
dc.date.available2014-12-13T10:33:39Z
dc.date.issued2003en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC92-2216-E009-005zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=828305&docId=156974en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/92183
dc.language.isozh_TWen_US
dc.title銅與低介電材料介電層之系統整合及可靠度提升研究(II)zh_TW
dc.titleThe Reliability Enhancement for the Integrated System of Copper and Low K Dielectric Interconnect (II)en_US
dc.typePlanen_US

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