超高真空化學氣相沉積低溫新穎複晶矽薄膜電晶體之製作與可靠度的研究---總計畫 (III)
| dc.contributor.author | 張俊彥 | en_US |
| dc.contributor.author | CHANG CHUN-YEN | en_US |
| dc.contributor.department | 國立交通大學電子工程學系 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:35:29Z | |
| dc.date.available | 2014-12-13T10:35:29Z | |
| dc.date.issued | 2000 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC89-2218-E009-087 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=597417&docId=112582 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/93463 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | 超高真空化學氣相沉積低溫新穎複晶矽薄膜電晶體之製作與可靠度的研究---總計畫 (III) | zh_TW |
| dc.title | Study of UHVCVD Deposited Poly-Si TFTs with Low Temperature Gate Dielectric and Novel Structure(III) | en_US |
| dc.type | Plan | en_US |