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Temperature Dependence of Ionization Rates in GaAs

dc.citation.epage104en_US
dc.citation.issue2en_US
dc.citation.spage99en_US
dc.citation.volume3en_US
dc.contributor.author張義昭zh_TW
dc.contributor.author施敏zh_TW
dc.contributor.authorY.J.Changen_US
dc.contributor.authorS.M.Szeen_US
dc.date.accessioned2017-10-06T06:17:46Z
dc.date.available2017-10-06T06:17:46Z
dc.date.issued1969-04en_US
dc.description.abstractThe ionization rate is one of the most important material parameters of semiconductors. Its temperature dependence has profound effect on the avalanche breakdown voltage of p-n junctions and on the operational characteristics of many semiconductor devices including IMPATT diodes and avalanche photodetectors (1). The ionization rates of electrons and holes in GaAs are measured here in over the temperature range 77°K to 373°K using photomultiplication method. The results are then compared with the modified Baraff theory(2,3), in order to establish a functional dependence of the ionization rate on temperature.en_US
dc.identifier.journal交大學刊zh_TW
dc.identifier.journalSCIENCE BULLETIN NATIONAL CHIAO-TUNG UNIVERSITYen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/137449
dc.language.isoen_USen_US
dc.publisher交大學刊編輯委員會zh_TW
dc.titleTemperature Dependence of Ionization Rates in GaAsen_US
dc.typeCampus Publicationsen_US

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