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以準分子雷射退火技術製作低溫複(單)晶矽薄膜電晶體元件
以準分子雷射退火技術製作低溫複(單)晶矽薄膜電晶體元件
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892215E009108.pdf
(363.68 KB)
Date
2000
Authors
鄭晃忠
CHENG HUANG-CHUNG
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https://www.grb.gov.tw/search/planDetail?id=583906&docId=109711
https://ir.lib.nycu.edu.tw/handle/11536/100361
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