193奈米微影用嵌附式減光型相移圖罩之研製與模擬
| dc.contributor.author | 龍文安 | en_US |
| dc.contributor.author | Loong Wen-an | en_US |
| dc.contributor.department | 國立交通大學應用化學系 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:36:17Z | |
| dc.date.available | 2014-12-13T10:36:17Z | |
| dc.date.issued | 2000 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC89-2215-E009-088 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=583831&docId=109691 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/93840 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | 193奈米微影用嵌附式減光型相移圖罩之研製與模擬 | zh_TW |
| dc.title | Fabrication and Simulation of an Embedded Attenuated Phase-Shift Mask in 193 nm | en_US |
| dc.type | Plan | en_US |
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