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新型低溫複晶矽(矽鍺)電晶體及奈米碳管場發射元件---子計畫II:低溫快速金屬誘發之結晶層製作薄膜電晶體(I)

dc.contributor.author馮明憲en_US
dc.contributor.department國立交通大學材料科學工程研究所zh_TW
dc.date.accessioned2014-12-13T10:34:09Z
dc.date.available2014-12-13T10:34:09Z
dc.date.issued2003en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC92-2215-E009-067zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=873563&docId=167363en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/92561
dc.language.isozh_TWen_US
dc.title新型低溫複晶矽(矽鍺)電晶體及奈米碳管場發射元件---子計畫II:低溫快速金屬誘發之結晶層製作薄膜電晶體(I)zh_TW
dc.titleIntegration of Thin Film Transistors on Rapid, and Low Temperature Crystallized Active Layers via Metal Inducing Mechanisms (I)en_US
dc.typePlanen_US

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