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Sensing element integrating silicon nanowire gated-diodes, manufacturing method and detecting system thereof

dc.citation.patentcountryUSAzh_TW
dc.citation.patentnumber20100321044zh_TW
dc.contributor.authorSheu, Jeng-Tzongen_US
dc.contributor.authorChen, Chen-Chiaen_US
dc.date.accessioned2014-12-16T06:15:29Z
dc.date.available2014-12-16T06:15:29Z
dc.date.issued2010-12-23en_US
dc.description.abstractThe invention disclosed a sensing element integrating silicon nanowire gated-diodes with microfluidic channel, a manufacturing method and a detecting system thereof. The sensing element integrating silicon nanowire gated-diodes with a microfluidic channel comprises a silicon nanowire gated-diode, a plurality of reference electrodes, a passivation layer and a microfluidic channel. The reference electrodes are formed on the silicon nanowire gated-diodes, and the passivation layer having a surface decorated with chemical materials is used for covering the silicon nanowire gated-diodes, and the microfluidic channel is connected with the passivation layer. When a detecting sample is connected or absorbed on the surface of the passivation layer, the sensing element integrating silicon nanowire gated-diodes with the microfluidic channel can detect an electrical signal change.zh_TW
dc.identifier.govdocG01R027/08zh_TW
dc.identifier.govdocH01L029/772zh_TW
dc.identifier.govdocH01L021/02zh_TW
dc.identifier.govdocG01R019/00zh_TW
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/105349
dc.language.isozh_TWen_US
dc.titleSensing element integrating silicon nanowire gated-diodes, manufacturing method and detecting system thereofzh_TW
dc.typePatentsen_US

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