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Inelastic electron dephasing times in CuxGe100-x alloys

dc.citation.epage461en_US
dc.citation.issue1-4en_US
dc.citation.spage460en_US
dc.citation.volume280en_US
dc.contributor.authorLin, JJen_US
dc.contributor.authorSheng, PJen_US
dc.contributor.authorHsu, SYen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department物理研究所zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentInstitute of Physicsen_US
dc.date.accessioned2014-12-08T15:45:19Z
dc.date.available2014-12-08T15:45:19Z
dc.date.issued2000-05-01en_US
dc.description.abstractWe have studied the inelastic electron dephasing scattering times, tau(i). in disordered CuxGe100-x(35 less than or equal to x less than or equal to 60) alloys between I and 15 K. The values of tau(i)(-1) (similar to T-p), and especially the exponent of temperature p, are extracted from weak localization studies. We find that the value of p continuously decreases from similar to 3 to similar to 1 as x gradually decreases from 60 to 35. Our observation is understood in terms of a crossover of the inelastic electron dephasing in impure metals from e-Fh scattering to critical e-e scattering as the disorder greatly increases and the system moves significantly toward the mobility edge. (C) 2000 Elsevier Science B.V. All. rights reserved.en_US
dc.identifier.doi10.1016/S0921-4526(99)01836-0en_US
dc.identifier.issn0921-4526en_US
dc.identifier.journalPHYSICA Ben_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0921-4526(99)01836-0en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/30545
dc.identifier.wosnumberWOS:000086333700134
dc.language.isoen_USen_US
dc.subjectdephasing timesen_US
dc.subjectdisordered metalsen_US
dc.subjectelectron-electron relaxationen_US
dc.subjectelectron-phonon relaxationen_US
dc.titleInelastic electron dephasing times in CuxGe100-x alloysen_US
dc.typeArticle; Proceedings Paperen_US

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