Optimum conditions for thermal fixing of volume holograms in Fe : LiNbO3
| dc.citation.epage | 90 | en_US |
| dc.citation.spage | 83 | en_US |
| dc.citation.volume | 3801 | en_US |
| dc.contributor.author | Lin, SAH | en_US |
| dc.contributor.author | Hsieh, CR | en_US |
| dc.contributor.author | Hsieh, TC | en_US |
| dc.contributor.author | Hsu, KY | en_US |
| dc.contributor.department | 光電工程學系 | zh_TW |
| dc.contributor.department | Department of Photonics | en_US |
| dc.date.accessioned | 2014-12-08T15:27:09Z | |
| dc.date.available | 2014-12-08T15:27:09Z | |
| dc.date.issued | 1999 | en_US |
| dc.description.abstract | The kinetics of the recording, compensating, and developing processes in two typical thermal fixing procedures (L-H-L and H-L procedures) are analyzed. The optimum condition (in terms of the fixing temperature, compensation time and material parameters) for each fixing procedures are obtained under the boundary condition of short-circuit. Experimental results are shown which are in qualitative agreement with the theory in L-H-L procedure. | en_US |
| dc.identifier.doi | 10.1117/12.363921 | en_US |
| dc.identifier.isbn | 0-8194-3287-3 | en_US |
| dc.identifier.issn | 0277-786X | en_US |
| dc.identifier.journal | PHOTOREFRACTIVE FIBER AND CRYSTAL DEVICES: MATERIALS, OPTICAL PROPERTIES, AND APPLICATIONS V | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1117/12.363921 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/19386 | |
| dc.identifier.wosnumber | WOS:000083314900010 | |
| dc.language.iso | en_US | en_US |
| dc.subject | photorefractive crystal | en_US |
| dc.subject | thermal fixing | en_US |
| dc.subject | lithium niobate crystal | en_US |
| dc.subject | volume hologram | en_US |
| dc.title | Optimum conditions for thermal fixing of volume holograms in Fe : LiNbO3 | en_US |
| dc.type | Proceedings Paper | en_US |