Determining thickness of films on a curved substrate by use of ellipsometric measurement
| dc.citation.epage | 0 | en_US |
| dc.citation.spage | 0 | en_US |
| dc.citation.volume | 7065 | en_US |
| dc.citation.woscount | 0 | en_US |
| dc.contributor.author | Han, Chien-Yuan | en_US |
| dc.contributor.author | Lee, Zhen-You | en_US |
| dc.contributor.author | Chao, Yu-Faye | en_US |
| dc.contributor.department | 光電工程學系 | zh_TW |
| dc.contributor.department | Department of Photonics | en_US |
| dc.date.accessioned | 2019-04-03T06:47:44Z | |
| dc.date.available | 2019-04-03T06:47:44Z | |
| dc.date.issued | 2008-01-01 | en_US |
| dc.description.abstract | The three intensity polarizer-sample-analyzer imaging ellipsometry is used to measure the ellipsometric parameters (Psi, Delta). In addition to the ellipsometric parameters, we introduce an extra angle alpha to measure the of the azimuth deviation of polarizer. After careful calibration, we found this deviation can indicate how much the surface normal slanted from the plane; then it can be used to deduce the thickness profile coated on a cylindrical lens. Using this technique, we. not only can determine the radius curvature of the curved surface, we also can calculate the thickness of the thin film coated on a curved surface. | en_US |
| dc.identifier.doi | 10.1117/12.794178 | en_US |
| dc.identifier.isbn | 978-0-8194-7285-4 | en_US |
| dc.identifier.issn | 0277-786X | en_US |
| dc.identifier.journal | REFLECTION, SCATTERING, AND DIFFRACTION FROM SURFACES | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1117/12.794178 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/146216 | |
| dc.identifier.wosnumber | WOS:000262438500028 | en_US |
| dc.language.iso | en_US | en_US |
| dc.subject | imaging ellipsometry | en_US |
| dc.subject | thin film thickness | en_US |
| dc.subject | curved surface | en_US |
| dc.title | Determining thickness of films on a curved substrate by use of ellipsometric measurement | en_US |
| dc.type | Proceedings Paper | en_US |