Investigation of Characteristics of Multi-Function ZnO Thin Film Deposited With Various Argon and Oxygen Ratios

Abstract

The ZnO thin film was deposited on a glass substrate at RT by the RF reactive magnetron sputtering method. Structural, chemical, optical, and hydrophilic/hydrophobic properties are measured by using a surface profilometer, an x-ray diffractometry (XRD), an x-ray photoelectron spectroscopy (XPS), a UV-VIS spectrophotometer, and a contact angle system, respectively. Results show that the deposition rate decreases with increasing O(2)/(Ar+O(2)) ratio. In additiion, the best stoichiometric and quality of ZnO thin film was observed at 0.30 Of O(2)/(Ar+O(2)) ratio, which shows the smallest FWHM and the strongest O-Zn strength. Regardless Of O(2)/(Ar+O(2)) ratio effect or thickness effect, high transmittance (> 86%) in the visible region is observed, while the UV-shielding characteristics depend upon both the magnitude of film thickness. The film thickness plays a more prominent role in controlling optical properties, especially in the UV-shielding characteristics, than the O(2)/(Ar+O(2)) ratio. However, the hydrophobic characteristics can be obtained when the glass coating with ZnO thin films. In general, with properly coated ZnO thin film, we can obtain a glass substrate which is highly transparent in the visible region, has good UV-shielding characteristics, and possesses highly hydrophobic characteristics (self-clean capability), which is highly suitable for applications in the glass industries.